发明名称 Split gate flash memory and formation method thereof
摘要 A split gate flash memory. A drain is disposed in the bottom of a trench formed in a substrate. A source is disposed in the substrate outside the trench. A striped floating gate is disposed at a sidewall of the trench, wherein one side of the striped floating gate is near the bottom of the trench, and the other side of the striped floating gate protrudes above the substrate. A control gate winds along the floating gate, wherein one side of the control gate is near the bottom of the trench, and the other side of the control gate in outside the trench. A metal bit line connects to the drain.
申请公布号 US2003186506(A1) 申请公布日期 2003.10.02
申请号 US20020295298 申请日期 2002.11.15
申请人 NANYA TECHNOLOGY CORPORATION 发明人 HUANG TSAI-YU
分类号 H01L21/8247;H01L27/115;(IPC1-7):H01L21/336 主分类号 H01L21/8247
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