发明名称 |
Substrate processing apparatus and slit nozzle |
摘要 |
A slit nozzle includes a solution feeding mechanism having an elastic element and a plurality of piezoelectric devices and embedded in a side surface of a flow passage near a slit in the slit nozzle. Control is effected so that the piezoelectric devices are vibrated to cause the elastic element to produce traveling waves toward the slit. A resist solution serving as a processing solution is pumped by the traveling waves, thereby to be discharged through the slit toward a substrate. This provides a substrate processing apparatus capable of smoothly discharging the processing solution to accomplish high discharge accuracy.
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申请公布号 |
US2003183167(A1) |
申请公布日期 |
2003.10.02 |
申请号 |
US20030391910 |
申请日期 |
2003.03.18 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
KITAZAWA HIROYUKI;UEYAMA TSUTOMU |
分类号 |
G03F7/16;B05B1/04;B05C5/02;C03C17/00;H01L21/027;(IPC1-7):B05C5/00 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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