发明名称 Method for producing a semiconductor wafer, semiconductor chip, and intermediate semiconductor product
摘要 A semiconductor wafer is produced with an outer contact layer applied to the entire surface of an insulating layer and a rewiring layer embedded therein. At the same time, fuses are short-circuited. After the outer contact layer has been patterned and a passivation layer has been applied, outer contacts and short-circuit lines are uncovered. Outer contacts are introduced into passage openings in the passivation layer. The semiconductor structures are tested and predetermined short-circuit lines are interrupted. Then, the semiconductor wafer is diced into semiconductor chips.
申请公布号 US2003186487(A1) 申请公布日期 2003.10.02
申请号 US20030402811 申请日期 2003.03.28
申请人 HOGERL JURGEN 发明人 HOGERL JURGEN
分类号 H01L21/60;H01L21/66;H01L23/525;(IPC1-7):H01L21/44;H01L29/00;H01L21/78;H01L21/46 主分类号 H01L21/60
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