| 摘要 |
A management system for semiconductor fabrication devices is provided with a sensor for always collecting management information from a fabrication device provided in a semiconductor fabrication process line, and a determiner for monitoring the management information collected by the sensor as a time-sequential measured value pattern, and for comparing the measured value pattern with a set value pattern registered beforehand in accordance with the management information. This enables to presume causes or the like of failures based on data, and hence, to immediately identify the causes of even sudden failures, thereby allowing measures to be immediately taken. Consequently, the process line can be stably operated.
|
