发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND CIRCUIT BOARD AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device which improves manufacturing efficiency and reduces manufacturing costs by reducing the number of processes in forming an electrode structure, improves the degree of freedom in designing, and ensures solidity; a semiconductor device manufactured by the method; and a circuit board and an electronic apparatus provided with the semiconductor device. SOLUTION: An opening is formed in a passivation film 18 followed by forming an opening in an electrode pad 16. Thereafter, a hole H3 is formed in a substrate 10 through the passivation film 18 that serves as a mask. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003273106(A) 申请公布日期 2003.09.26
申请号 JP20020069163 申请日期 2002.03.13
申请人 SEIKO EPSON CORP 发明人 MATSUI KUNIYASU
分类号 H01L23/52;H01L21/3205;H01L21/60;(IPC1-7):H01L21/320 主分类号 H01L23/52
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