发明名称 |
OXIDE SEMICONDUCTOR LAYER, METHOD OF FORMING THE SAME, AND SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an oxide semiconductor layer whose adhesion is improved and whose variation in conductivity with time is reduced. <P>SOLUTION: This oxide semiconductor layer is an oxide semiconductor layer 12 mainly composed of Sr and Cu, and includes an element (for example, Ar) whose reactivity with Sr and Cu is low. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003273133(A) |
申请公布日期 |
2003.09.26 |
申请号 |
JP20020071514 |
申请日期 |
2002.03.15 |
申请人 |
SANYO ELECTRIC CO LTD |
发明人 |
YADA SHIGERO;ISOMURA MASAO |
分类号 |
C23C14/34;H01L21/363;H01L29/786;H01L33/28;H01L33/42 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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