发明名称 MARKING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent a defective article from being handled as a normal article due to a marking error in acceptance/rejection marking at the electrical characteristic inspection of an IC chip on a wafer. SOLUTION: In a method, the electrical inspection of the IC chips formed on the wafer is performed and the IC chip determined as the normal article is marked at a predetermined place where it does not cause an operational failure. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003273172(A) 申请公布日期 2003.09.26
申请号 JP20020075654 申请日期 2002.03.19
申请人 SEIKO INSTRUMENTS INC 发明人 IWASA SHINICHI
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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