发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A displacement measurement system constructed and arranged to measure the position of optical elements in a projection system of a lithographic projection apparatus makes use of the interferential measurement principle which involves use of a first diffraction grating mounted on the optical element and a second diffraction grating mounted on a reference frame.
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申请公布号 |
US2003179357(A1) |
申请公布日期 |
2003.09.25 |
申请号 |
US20030386932 |
申请日期 |
2003.03.13 |
申请人 |
ASML NETHERLANDS, B.V. |
发明人 |
RAVENSBERGEN MARIUS |
分类号 |
G01B11/00;G01D5/38;G02B5/18;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/54;G03B27/42 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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