发明名称 Lithographic apparatus and device manufacturing method
摘要 A displacement measurement system constructed and arranged to measure the position of optical elements in a projection system of a lithographic projection apparatus makes use of the interferential measurement principle which involves use of a first diffraction grating mounted on the optical element and a second diffraction grating mounted on a reference frame.
申请公布号 US2003179357(A1) 申请公布日期 2003.09.25
申请号 US20030386932 申请日期 2003.03.13
申请人 ASML NETHERLANDS, B.V. 发明人 RAVENSBERGEN MARIUS
分类号 G01B11/00;G01D5/38;G02B5/18;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/54;G03B27/42 主分类号 G01B11/00
代理机构 代理人
主权项
地址