PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a high-quality phase shift mask blank and phase shift mask having the good intra-surface uniformity of the phase difference and transmittance rendered by a phase shift film and a method for manufacturing such phase shift mask blank and phase shift mask.

SOLUTION: The phase shift mask blank which is provided with at least one layer of the phase shift film on a substrate transparent to exposure light and in which the distribution of the phase difference in the phase shift film is within±1.5°and the distribution of the transmittance of the exposure is within±0.15% and the phase shift mask, and the method for manufacturing the phase shift mask blank and the phase shift mask.

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