Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method

摘要

Temperature control data necessary to keep the mirror figure constant is measured under the same conditions as those of actual exposure. In actual exposure, the temperature is controlled using the data, a mirror heated by irradiation of exposure light is cooled, and any figure change is suppressed. This arrangement provides an exposure apparatus capable of stable exposure while suppressing mirror deformation caused by heat generation upon absorption of exposure light.