发明名称 MASK STORAGE DEVICE, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <p>A mask storage device (20), wherein a mask (R) is stored in an internal space through an opening (211a or 211b) opened by an open/close door (205a or 205b), and the opening is closed by the open/close door to store the mask in the internal space shielded from the outside air, and a part of the storage device is formed of permeable members (201a, 201b) allowing cleaning light to transmit therethrough so that the mask can be optically cleaned in the stored state in the storage device, whereby the mask can be prevented from being chemically contaminated, and the replacement of gas in a carrying route can be eliminated by carrying the mask in the stored state in the storage device.</p>
申请公布号 WO2003079419(P1) 申请公布日期 2003.09.25
申请号 JP2003003107 申请日期 2003.03.14
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