| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an antireflection film by a new sputtering method. <P>SOLUTION: When an antireflection film is manufactured on the surface of a plastic base material by sputtering, a metal film is preliminarily introduced as an intermediate layer onto the surface of the base material. The metal film is preferably introduced by sputtering. The metal to form the metal film is preferably one or more kinds selected from a group consisting of titanium, silicon, aluminum, zinc, zirconium, tantalum and magnesium. <P>COPYRIGHT: (C)2003,JPO |
