发明名称 TREATMENT CONDITION DECISION METHOD, TREATMENT CONDITION DECISION SYSTEM, TREATMENT SYSTEM, TREATMENT CONDITION DECISION CALCULATOR PROGRAM, PROGRAM RECORDING MEDIUM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 In step (S11), amounts (parameters) to be varied are respectively varied by a predetermined pitch and standard treatment conditions are decided by combining the parameters. For each of the standard treatment conditions, treatment is performed actually and the treatment shape obtained is made to be a standard treatment shape corresponding to the standard treatment condition (step 12). When an appropriate simulation program is available, it is possible to obtain a standard treatment shape by simulation without performing the treatment actually. The standard treatment conditions and the standard treatment shapes thus obtained are stored in a storage device. When a target shape to be obtained by treatment is given in step (S13), a standard treatment shape similar to the target shape is searched in step (S14). Thus, when a treatment shape is given, the corresponding treatment condition can be decided.
申请公布号 WO03078104(A1) 申请公布日期 2003.09.25
申请号 WO2003JP03304 申请日期 2003.03.19
申请人 NIKON CORPORATION;SENGA, TATSUYA;USHIO, YOSHIJIRO 发明人 SENGA, TATSUYA;USHIO, YOSHIJIRO
分类号 B24B37/04;B24B49/00;H01L21/3105;H01L21/321;H01L21/768;(IPC1-7):B24B49/10;B24B37/00;H01L21/304;B23Q15/00 主分类号 B24B37/04
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