发明名称 PHOTO-SETTING RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photo-setting resin composition affording a resin for optical materials having a high refractive index and high light resistance. SOLUTION: The photo-setting resin composition comprises a compound (A) represented by general formula (1) (wherein, R<SP>1</SP>denotes a hydrogen atom or a methyl group; X denotes a 1-4C alkyl group or a halogen atom; and m denotes an integer of 0-4), a compound (B) represented by general formula (2) (wherein, R<SP>2</SP>denotes a hydrogen atom or a methyl group; Y denotes a sulfur atom or an oxygen atom; and n denotes an integer of 0-5) and a photopolymerization initiator. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003268049(A) 申请公布日期 2003.09.25
申请号 JP20020076688 申请日期 2002.03.19
申请人 SUMITOMO SEIKA CHEM CO LTD 发明人 MARUO JUNICHI;YAMAMOTO KATSUMASA;SUZUKI MICHIO
分类号 C08F220/38;C08F290/06;(IPC1-7):C08F220/38 主分类号 C08F220/38
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