发明名称 |
PHOTO-SETTING RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photo-setting resin composition affording a resin for optical materials having a high refractive index and high light resistance. SOLUTION: The photo-setting resin composition comprises a compound (A) represented by general formula (1) (wherein, R<SP>1</SP>denotes a hydrogen atom or a methyl group; X denotes a 1-4C alkyl group or a halogen atom; and m denotes an integer of 0-4), a compound (B) represented by general formula (2) (wherein, R<SP>2</SP>denotes a hydrogen atom or a methyl group; Y denotes a sulfur atom or an oxygen atom; and n denotes an integer of 0-5) and a photopolymerization initiator. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003268049(A) |
申请公布日期 |
2003.09.25 |
申请号 |
JP20020076688 |
申请日期 |
2002.03.19 |
申请人 |
SUMITOMO SEIKA CHEM CO LTD |
发明人 |
MARUO JUNICHI;YAMAMOTO KATSUMASA;SUZUKI MICHIO |
分类号 |
C08F220/38;C08F290/06;(IPC1-7):C08F220/38 |
主分类号 |
C08F220/38 |
代理机构 |
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地址 |
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