发明名称 |
FILM FORMING APPARATUS, HEAD CLEANING METHOD, APPARATUS FOR MANUFACTURING DEVICE, AND DEVICE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a means to reliably and uniformly clean all nozzle surfaces of all heads. <P>SOLUTION: A wiping unit 70 includes a wiping sheet 75 and a roller 76. The roller 76 has a plurality of pressing surfaces 76b1 divided in the direction of a roller 76 axis line according to a pitch between respective nozzle surfaces 53a, and a rotary shaft 76a which makes the axis line a common axis line. Each pressing surface 76b1 is pressed against each nozzle surface 53a through the wiping sheet 75, thereby cleaned. <P>COPYRIGHT: (C)2003,JPO</p> |
申请公布号 |
JP2003270424(A) |
申请公布日期 |
2003.09.25 |
申请号 |
JP20020073065 |
申请日期 |
2002.03.15 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NAKAMURA SHINICHI |
分类号 |
B41J2/165;G02B5/20;(IPC1-7):G02B5/20 |
主分类号 |
B41J2/165 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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