| 摘要 |
Provided is a method of manufacturing a thin film magnetic head which enables dimensional control of a pole width and enables reducing the time required to form the pole width. After a top pole chip precursory layer made of iron nitride is formed by sputtering, a surface of the top pole chip precursory layer is polished and flattened. A first mask precursory layer and a photoresist film are formed in sequence on the flattened top pole chip precursory layer. A photoresist pattern having an opening is formed by selectively exposing and patterning the photoresist film by photolithography. The surface of the top pole chip precursory layer is polished and flattened, and thus a surface of the first mask precursory layer formed over the top pole chip precursory layer is also flat. Thus, pattern deformation resulting from light reflected from an underlayer during exposure is prevented, and therefore the opening of the photoresist pattern can be formed with high accuracy.
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