METHOD FOR MANUFACTURING MASTER DISK FOR OPTICAL INFORMATION RECORDING MEDIUM, APPARATUS FOR TREATING MASTER DISK, MASTER DISK, STAMPER, METHOD FOR MANUFACTURING STAMPER, AND OPTICAL INFORMATION RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To prevent the production of photoresist residues on a master disk surface of photoresist patterns after development of the master disk and the deterioration in the characteristics of an optical information recording medium when an exposure capability, developability and photoresist resolution are insufficient with respect to desired pattern dimensions. SOLUTION: The master disk is irradiated, after development, with at least one of irradiation treatment media 104, such as light, plasma, and ion having 1 or under in the etching selection ratio of the master disk substrate and below 40 nm/min in an etching treatment rate. COPYRIGHT: (C)2003,JPO