METHOD FOR PREVENTING PATTERN COLLAPSE

摘要

PURPOSE: A method is provided to be capable of preventing pattern collapse generated at the edge portion of field and pattern block. CONSTITUTION: A mask comprising a plurality of lines(a) and spacers(b) is prepared. A dummy pattern(c) is formed at one end of the lines(a) for supporting patterns. As the mask, BIM(Binary Intensity Mask), PSM(Phase Shift Mask) or HT-PSM(Half Ton-Phase Shift Mask) is used. By inserting the dummy pattern(c) connected to the one end of the lines(a), the pattern collapse is prevented.