STRAIN MEASURING INSTRUMENT, STRAIN SUPPRESSING DEVICE, EXPOSURE SYSTEM, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To accurately measure strains generated in an object and significantly reduce the strains.

SOLUTION: In a moving stage system 803, strains generated in the surface 800 of a moving stage is controlled so as to suppress the strains by using a strain measuring instrument 801 which measures the strains generated in the surface 800 and a strain suppressing device 802 which controls the strains. The strain measuring instrument 801 and strain suppressing device 802 are not bonded directly to the surface 800 of the moving stage. In addition, the instrument 801 measures the strains generated in the surface 800 in one direction only. Moreover, the device 802 is attached to the surface 800 of the moving stage so that forces transmitted to the moving stage may become one-directional components. Consequently, the strains generated in the surface 800 of the moving stage can be suppressed significantly by accurately measuring the strains.

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