发明名称 Long persistent phosphor incorporated within a settable material
摘要 A process for incorporating a long persistent phosphor within a settable material includes firing a doped phosphor to obtain a phosphor having a persistence that ranges from minutes to hours. The fired phosphor is then ground into a phosphor particulate having a mean domain size. Typical particulate mean domain size ranges from 1 to 60 microns. The phosphor particulate is thereafter encapsulated within a water impervious coating material such as silicon oxide or fluoride. The coated phosphor particulate is then mixed in a specified volume ratio within the settable material while the settable material is in a pre-set state. Typical formulation ratios range from 0.1 to 30 volume percent of particulate. A method of forming a phosphorescent solid article is also disclosed.
申请公布号 US2003173540(A1) 申请公布日期 2003.09.18
申请号 US20030149466 申请日期 2003.02.19
申请人 MORTZ BRADFORD K;MILLER ROBERT H 发明人 MORTZ BRADFORD K;MILLER ROBERT H
分类号 C04B14/36;C09K11/02;C09K11/77;(IPC1-7):C09K11/02;C09K11/08 主分类号 C04B14/36
代理机构 代理人
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