| 发明名称 |
Apparatus for cyclical deposition of thin films |
| 摘要 |
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
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| 申请公布号 |
US2003172872(A1) |
申请公布日期 |
2003.09.18 |
| 申请号 |
US20030352257 |
申请日期 |
2003.01.27 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
THAKUR RANDHIR P.S.;MAK ALFRED W.;XI MING;GLENN WALTER BENJAMIN;KHAN AHMAD A.;AL-SHAIKH AYAD A.;GELATOS AVGERINOS V.;UMOTOY SALVADOR P. |
| 分类号 |
C23C16/44;C23C16/452;C23C16/455;H01J37/32;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
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