| 摘要 |
<p>An operating voltage is supplied to first and second groups in accordance with a recipe for thermally processing a semiconductor wafer. It is then determined that the operating voltage is an undesired voltage in a range of voltages between a predetermined lower voltage and a predetermined upper voltage. Subsequently, a first voltage is applied to the first group of heating lamps and a second voltage is delivered to the second group of heating lamps. The first voltage is above the predetermined upper voltage, while the second voltage is below the predetermined lower voltage. Also, a weighted average of the first and second voltages approximates the undesired voltage. In the meantime, the operational voltage is supplied to a remainder of the array of heating lamps in accordance with the recipe, where the operational voltage is below the predetermined upper voltage.</p> |
