发明名称 SUBSTRATE ALIGNMENT APPARATUS
摘要 A substrate support that aligns a substrate placed thereon is generally provided. In one aspect, a substrate support for supporting a substrate includes a support plate, an alignment member and a cylindrical member. The alignment member is disposed proximate a first edge of the support plate while the cylindrical member is disposed proximate an adjacent, second edge of the support plate. The alignment member extends above the support plate and is adapted to urge the substrate in a first direction. The cylindrical member has a rotational axis aligned with the first direction. In another aspect of the invention, a load lock chamber is provided that includes a chamber body having a first and a second substrate transfer ports. A support plate is disposed in the chamber body and has a substrate alignment mechanism interacting therewith that aligns the substrate on the support plate.
申请公布号 WO03077288(A1) 申请公布日期 2003.09.18
申请号 WO2003US06304 申请日期 2003.03.04
申请人 APPLIED MATERIALS, INC. 发明人 KIM, KYUNG-TAE;NGUYEN, HUNG, THE
分类号 H01L21/00;H01L21/68;H01R11/00;H01R13/66;H01R13/713;H01R25/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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