发明名称 Laser beam exposure apparatus with array refracting element
摘要 <p>The present invention provides an exposure apparatus which can improve quality of an image formed on a recording medium. The exposure apparatus comprises an array refracting element which divides a laser beam in a sub-scanning direction on a light path of the laser beam between an emission opening of the laser beam and a recording film, and in which a pair of refracting members are formed to be arranged in a line, and a focal distance f of a condenser lens, a wavelength lambda of the light beam, and a width d for the division direction of a divided region of the laser beam in the refracting member are determined so that a value (fx lambda )/d obtained by dividing a product value of the focal distance f and the wavelength lambda by the width d is not more than a predetermined value. &lt;IMAGE&gt;</p>
申请公布号 EP1345064(A2) 申请公布日期 2003.09.17
申请号 EP20030004904 申请日期 2003.03.06
申请人 FUJI PHOTO FILM CO., LTD. 发明人 MIYAGAWA, ICHIROU
分类号 B41J2/44;G02B26/08;G02B26/10;G02B27/28;(IPC1-7):G02B27/00 主分类号 B41J2/44
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