发明名称 PATTERN FORMING METHOD AND DEVICE AND SEMICONDUCTOR DEVICE, ELECTRIC CIRCUIT, DISPLAY ELEMENT MODULE AND LUMINOUS ELEMENT
摘要 A pattern material supply unit (300) has a shower head (310) for producing a particle mist from the liquid pattern material (312) and discharging the mist. A process stage (318) on which the workpiece (20) is placed is disposed below the shower head (310). A hydrophobic processed mask with pattern forming openings is disposed on the surface of the workpiece (20). A voltage is applied by a dc power source (328) to the workpiece (20) by way of the intervening process stage (318) so that particles of the liquid pattern material (312) are attracted thereto by static attraction. The liquid pattern material adhering to the mask surface fills in the pattern forming openings disposed in the mask as a result of the process stage (318) rotating, and the liquid pattern material can be heated and solidified by an internal heater (326). <IMAGE>
申请公布号 EP1345261(A1) 申请公布日期 2003.09.17
申请号 EP20010272299 申请日期 2001.12.21
申请人 SEIKO EPSON CORPORATION 发明人 MORI, YOSHIAKI;MIYAKAWA, TAKUYA;TAKAGI, KENICHI;ASUKE, SHINTARO;SATO, MITSURU
分类号 H01L21/00;H01L21/027;H01L21/288;H01L21/3205;H01L21/768;H05K3/04;(IPC1-7):H01L21/00;H01L21/320 主分类号 H01L21/00
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