发明名称 PLASMA PROCESSING APPARATUS AND DRIVING METHOD THEREOF, PLASMA PROCESSING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE
摘要 A plasma processing apparatus and a driving method thereof, and a plasma processing method, and a manufacturing method of an electronic device are provided to activate cleaning gas by utilizing the power of microwave. A plasma processing apparatus, which includes a space part(66) and a cleaning gas path(61), executes a plasma process on an objective processing member disposed in a processing chamber by utilizing microwaves through a waveguide(35). The space part is surrounded by a wall formed dielectrics in the waveguide. The cleaning gas path is used to supply cleaning gas into the processing chamber through the space part.
申请公布号 KR20080034079(A) 申请公布日期 2008.04.18
申请号 KR20070102596 申请日期 2007.10.11
申请人 TOKYO ELECTRON LIMITED;TOHOKU UNIVERSITY 发明人 HIRAYAMA MASAKI;OHMI TADAHIRO;KITAMURA MASAYUKI;MURATA HITOSHI
分类号 H05H1/24;H05H1/30 主分类号 H05H1/24
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