发明名称 |
PLASMA PROCESSING APPARATUS AND DRIVING METHOD THEREOF, PLASMA PROCESSING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE |
摘要 |
A plasma processing apparatus and a driving method thereof, and a plasma processing method, and a manufacturing method of an electronic device are provided to activate cleaning gas by utilizing the power of microwave. A plasma processing apparatus, which includes a space part(66) and a cleaning gas path(61), executes a plasma process on an objective processing member disposed in a processing chamber by utilizing microwaves through a waveguide(35). The space part is surrounded by a wall formed dielectrics in the waveguide. The cleaning gas path is used to supply cleaning gas into the processing chamber through the space part. |
申请公布号 |
KR20080034079(A) |
申请公布日期 |
2008.04.18 |
申请号 |
KR20070102596 |
申请日期 |
2007.10.11 |
申请人 |
TOKYO ELECTRON LIMITED;TOHOKU UNIVERSITY |
发明人 |
HIRAYAMA MASAKI;OHMI TADAHIRO;KITAMURA MASAYUKI;MURATA HITOSHI |
分类号 |
H05H1/24;H05H1/30 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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