| 摘要 |
A heater support is provided to improve service life of the heater support by protecting a bottom part of a heater plate, central pipes, power lines and thermocouple lines from degradation due to contaminated gas and reflection heat, and a chemical vapor deposition apparatus using the heater support with an improved service life is provided. A heater support for a chemical vapor deposition apparatus comprises: a ceramic disc(110) joined with a heater plate(100); an upper flange(120) which is attached and fixed to a bottom of the ceramic disc, and in which mounting grooves(122,123) for the power lines and the thermocouple lines are formed; a lower flange(130) positioned at a lower side correspondingly to the upper flange; cylindrical central pipes(140) connected between the upper and lower flanges; power lines which are drawn out from the lower flange to the upper flange, and which are connected to the heater plate; and a thermocouple line supporting structure in which a supporting structure of a first thermocouple line(161) is embedded, and which has a supporting structure of a second thermocouple line(162) formed on an outer side of the central pipes, the first thermocouple line being penetrated into the ceramic disc within the central pipes, wherein the upper and lower flanges, the central pipes, the power lines, the thermocouple lines, and the thermocouple line supporting structure are covered with ceramics.
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