| 摘要 |
A defect inspecting apparatus for inspecting a defect of an object having a periodic pattern includes: a dark field illumination optical system that illuminates the object with substantially parallel illumination light in a direction having a predetermined first inclined angle relative to an inspection surface of the object; an imaging optical system having an imaging element for imaging the object illuminated with the illumination light, the imaging element having an imaging lens; and a defect detecting system for detecting the defect based on image data of the object thus imaged. A mutual positional relation ship between the direction of illumination by the illumination optical system and a direction of imaging by the imaging optical system is determined based on a diffraction angle defined by a period of the pattern and a wavelength of the illumination light. A sum of an aperture angle of the illumination light and an object side aperture angle of the imaging lens is set to be smaller than the diffraction angle.
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