发明名称 |
Electron injection in ion implanter magnets |
摘要 |
One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.
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申请公布号 |
US7402816(B2) |
申请公布日期 |
2008.07.22 |
申请号 |
US20050281175 |
申请日期 |
2005.11.17 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
RENAU ANTHONY;SMATLAK DONNA L.;BUFF JAMES;HERMANSON ERIC |
分类号 |
H01J1/50 |
主分类号 |
H01J1/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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