发明名称 Electron injection in ion implanter magnets
摘要 One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.
申请公布号 US7402816(B2) 申请公布日期 2008.07.22
申请号 US20050281175 申请日期 2005.11.17
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 RENAU ANTHONY;SMATLAK DONNA L.;BUFF JAMES;HERMANSON ERIC
分类号 H01J1/50 主分类号 H01J1/50
代理机构 代理人
主权项
地址