发明名称 Capacitor structure of semiconductor device and method for forming the same
摘要 A capacitor structure includes a device isolation layer pattern formed at a predetermined region of a semiconductor substrate to define an active region; an upper electrode disposed over an upper center of the active region to expose an edge of the active region; a lower electrode region formed in the active region under the upper electrode; and a lightly doped region overlapping with an outer edge of the lower electrode region. In this manner, the resulting breakdown voltage of the device can be increased.
申请公布号 US6621111(B2) 申请公布日期 2003.09.16
申请号 US20020279682 申请日期 2002.10.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG HO-IK
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L27/10;H01L27/108;H01L29/94;(IPC1-7):H01L27/108;H01L21/824 主分类号 H01L27/04
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