发明名称 |
1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE ESTER PHOTOSENSITIVE AGENT, METHOD FOR PRODUCING THE PHOTOSENSITIVE AGENT, AND PHOTORESIST COMPOSITION |
摘要 |
The invention provides a 1,2-naphthoquinone-2- diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The 1,2-naphthoquinone- 2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with 1,2-naphthoquinone-2- diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C10 aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group.
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申请公布号 |
CA2422211(A1) |
申请公布日期 |
2003.09.15 |
申请号 |
CA20032422211 |
申请日期 |
2003.03.14 |
申请人 |
TOYO GOSEI KOGYO CO., LTD. |
发明人 |
KATORI, SUEHIRO;MIYAZAKI, TSUNEAKI;IIDA, HIROTADA;HAGIWARA, YUICHI;TADA, KATSUMI;SUWA, MIHARU |
分类号 |
C07C309/76;G03F7/022;(IPC1-7):G03F7/022;C07C50/12 |
主分类号 |
C07C309/76 |
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