发明名称 MANUFACTURING SYSTEM OF SEMICONDUCTOR DEVICE AND GAS SUPPLY METHOD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing system of a semiconductor device which can optimize a gas supply in a production system of small amount of wide variety of goods, can effectively conduct a harm excluding treatment of harmful components, and further can achieve to decrease the plant cost or shorten the construction period including improvements in a leakage inspection method as a total system, and to provide a gas supply method for carrying out a gas supply effectively by utilizing the manufacturing system. SOLUTION: A manufacturing system of a semiconductor device comprises a gas supply line 35 for supplying a gas filled in a gas envelop 32 to a gas consumption plant 31, and a process gas harm removing line 37 for guiding an exhaust gas discharged from the gas consumption plant 31 to a harm removing device 34 through a vacuum pump 36. The downstream side of a purge gas exhaust line 44 provided by branching from the gas supply line 35 is connected to the process gas harm removing line 37. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003257870(A) 申请公布日期 2003.09.12
申请号 JP20020054197 申请日期 2002.02.28
申请人 NIPPON SANSO CORP 发明人 ORITA TAKASHI;WATANABE SADAHIDE;ISHIHARA YOSHIO
分类号 F17D1/04;B01J4/00;C23C16/44;F17D3/01;H01L21/205;(IPC1-7):H01L21/205 主分类号 F17D1/04
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