| 摘要 |
PROBLEM TO BE SOLVED: To solve such problems with the water repelling treatment of a substrate by methods in which fluoro plasma is applied thereto in the atmospheric pressure or vacuum or the substrate is coated with fluoro alkyl treating agent that the treatment requires much labor and foreign matter is adhered thereto. SOLUTION: The substrate is irradiated with ultraviolet ray 1 while making fluorine compound-contained gas 2 flowing on the surface of the substrate for water repelling treatment. By this method, thin-film is formed on the inside walls of the barrier, or an organic EL device is manufactured by a liquid phase method. Specifically, organic film formation, cathode film formation, and sealing are performed by rubbing washing, UV ozone washing, and ultraviolet fluoridization. COPYRIGHT: (C)2003,JPO
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