发明名称 PLASMA TREATMENT UNIT
摘要 PROBLEM TO BE SOLVED: To enable stable plasma treatment by enhancing the cooling efficiency of an electrode plate at an upper electrode of a plasma treatment unit. SOLUTION: A lower electrode is provided in a vacuum chamber, a substrate is mounted on it, and an upper electrode is provided in a region facing the substrate. The upper electrode is a laminate of three planar member, and a heat sink plate at its middle stage is composed of upper and lower boards which are bonded to each other. A gas passageway is formed in the upper electrode running through it vertically. The gas passageway is diffused in a distribution space formed in the upper heat sink plate and then heads toward the substrate through numerous pores. A cooling passageway is formed in the upper heat sink plate near its outer edge. The distribution space is shaped like a cylinder and positioned at a level as high as or higher than the cooling passageway. It is preferred that the height is 1-5 mm and that the length of each pore is 25 mm or more. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003257937(A) 申请公布日期 2003.09.12
申请号 JP20020051512 申请日期 2002.02.27
申请人 TOKYO ELECTRON LTD 发明人 SASAKI JUNICHI;MIYANO SHINICHI;IKEDA SAYOKO;SUZUKI TAKASHI
分类号 C23F4/00;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23F4/00
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