发明名称 HIGH FREQUENCY SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
摘要 <p>A semiconductor device (10) having a gate (15), a source (19), and a drain (20) with a gate bus (25) and first ground shield (24) patterned from a first metal layer and a second ground shield (31) patterned from a second metal layer. The first ground shield (24) and the second ground shield (31) lower the capacitance of device (10) making it suitable for high frequency applications and housing in a plastic package.</p>
申请公布号 WO2003075354(P1) 申请公布日期 2003.09.12
申请号 US2003005104 申请日期 2003.02.19
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