发明名称 Method of fabricating a semiconductor device
摘要 A semiconductor device having conductive paths separated by cavities is formed by depositing organic spin-on glass between the conductive paths, forming gaps between the organic spin-on glass and the conductive paths, and then removing the organic spin-on glass through the gaps. The gaps may be formed as a dummy pattern of via holes that are misaligned with the conductive paths, so that they extend past the upper surfaces of the conductive paths and form fine slits beside the conductive paths. This method of removing the spin-on glass leaves cavities that are free of unwanted oxide residue and debris, thereby minimizing the capacitive coupling between adjacent conductive paths.
申请公布号 US2003170974(A1) 申请公布日期 2003.09.11
申请号 US20030339454 申请日期 2003.01.10
申请人 SAKATA TOYOKAZU 发明人 SAKATA TOYOKAZU
分类号 H01L21/3065;H01L21/316;H01L21/768;H01L23/522;H01L23/532;(IPC1-7):H01L21/476;H01L21/469;H01L21/31 主分类号 H01L21/3065
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