Apparatus and method for placing particles in a pattern onto a substrate

摘要

An apparatus for placing particles onto a substrate, methods for using the apparatus to deposit particles on a substrate and substrates prepared using the apparatus are disclosed. The apparatus includes a rotary screen, a blade disposed for directing and urging the particles through the screen, and a sheet mounted in a position to receive the particles from a feeder and deliver the particles to the rotary screen substantially across the blade. The apparatus can include a frame on which a rotary screen is rotatably mounted and a feed system disposed within and extending substantially along the length of the screen for distributing the particles. The apparatus can optionally include a vacuum means, an anti-static means and/or collection pans for handling stray particles. The screen can include a series of openings in the form of a pattern, and can be used to place particles in a pattern in register with a design or pattern on a substrate as the substrate passes under the openings in the screen.