发明名称 Process to monitor a production process especially semiconductor etching, involves determining production parameters and using linear combinations
摘要 A process for computer monitoring of a production process determines many process parameters, chooses time regions before and after a given event and forms a linear combination so that curves in the two regions have predetermined shapes. Characteristic values are thus found and used to monitor the process. An Independent claim is also included for an arrangement to monitor the process as above comprising sensors and processors.
申请公布号 DE10208044(A1) 申请公布日期 2003.09.11
申请号 DE20021008044 申请日期 2002.02.25
申请人 INFINEON TECHNOLOGIES AG 发明人 KNOBLOCH, DIRK;VOIGTLAENDER, KNUT;ZIMPEL, JAN
分类号 G05B23/02;H01J37/32;H01L21/66;(IPC1-7):G05B23/00;G05B17/02;H01L21/18;H01L21/302 主分类号 G05B23/02
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