发明名称 Spatter ion pump
摘要 The sputter ion pump includes a vacuum chamber that includes an inner wall having a cylindrical section which is rugged in cross section. The rugged cylindrical section has outer recesses each of which is provided with a permanent magnets, each magnet having a same shape and a same characteristic so that a magnetic pole is directed to a same direction. The rugged cylindrical section has also inner recesses each of which is provided with a cylindrical anode electrode member spaced from the vacuum chamber wall. The rugged cylindrical section of the vacuum chamber wall is formed as a cathode electrode. A cylindrical shield member having a peripheral portion provided with evacuating bores is provided coaxially to the permanent magnets and anode electrodes. The permanent magnets and anode electrode members are arranged with equal spacing in an axis symmetrical configuration.
申请公布号 US6616417(B2) 申请公布日期 2003.09.09
申请号 US20010959879 申请日期 2001.11.09
申请人 ULVAC, INC. 发明人 SHEN GUO HUA
分类号 F04B37/02;H01J27/08;H01J41/18;H01J41/20;(IPC1-7):H02K44/00;H02K44/08 主分类号 F04B37/02
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