METHOD AND DEVICE FOR SURFACE TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide a surface treatment method and a surface treatment device which can remove an attaching substance in a base surface without using wet- type process by low temperature treatment alone. SOLUTION: In a surface treatment method for removing an attaching substance in a base surface Ws, after a washing gas G is supplied to the base surface Ws under light irradiation such as ultraviolet ray, rinse treatment is carried out by supplying supercritical fluid consisting of a supercritical substance L1to the base surface Ws. Carbon dioxide is preferably used for the supercritical fluid. Furthermore, a melting auxiliary agent L2for melting compound of an element of the washing gas G activated by light irradiation and an attaching substance is added to the supercritical fluid. COPYRIGHT: (C)2003,JPO