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发明名称
BILDUNG EINER SILICIUM-GERMANIUM-AUF-ISOLATOR-STRUKTUR DURCH OXIDATION EINER VERGRABENEN PORÖSEN SILICIUMSCHICHT
摘要
申请公布号
DE602004007940(T2)
申请公布日期
2008.04.24
申请号
DE200460007940T
申请日期
2004.09.10
申请人
INTERNATIONAL BUSINESS MACHINES CORP.
发明人
BEDELL, STEPHEN W.;CHOE, KWANG SU;FOGEL, KEITH F.;SADANA, DEVENDRA K.
分类号
H01L21/00;C22F1/10;H01L21/20;H01L21/762
主分类号
H01L21/00
代理机构
代理人
主权项
地址
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