EXPOSURE MASK, METHOD OF MANUFACTURING EXPOSURE MASK, AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure mask capable of decreasing the defects on a wafer occurring in the defects on the mask, a method of manufacturing the exposure mask and an exposure method.

SOLUTION: The exposure mask is provided with a design pattern 3 which forms an actual device and a monitor pattern which possesses a defect having the smallest defect size exceeding a permissible range and further a defect detectable by a defect inspection apparatus and having the defect size within the permissible range together with the design pattern. The defect inspection of the design pattern 3 and the defect inspection of the monitor pattern 5 are performed by using the defect inspection apparatus and after the defect of the monitor pattern 5 is confirmed to be detectable by the defect inspection apparatus, the defect of the design pattern 3 detected in the defect inspection is corrected.

COPYRIGHT: (C)2003,JPO