| 摘要 |
PROBLEM TO BE SOLVED: To control the thickness of a film formed on a substrate with high accuracy by making uniform the temperature of a monitoring substrate which monitors the thickness of the film. SOLUTION: An optical device for monitoring film thickness is provided with the monitoring substrate for monitoring the optical thickness of the optical thin film formed on the substrate 31, a heating means 3 which heats the substrate 31, and a rotating means 34 which continuously or intermittently rotates the monitoring substrate around an axis or its axis. Before the optical thin film is formed on the substrate 31, the temperature of the monitoring substrate is made uniform by actuating the rotating means 34 together with the heating means 3. COPYRIGHT: (C)2003,JPO
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