METHOD FOR ORGANIC BOTTOM ANTIREFLECTIVE COATING AND PHOTORESIST TRIMMING PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a method for etching an organic bottom antireflective coating (OBARC) and a photoresist material in a single etching process. SOLUTION: The method comprises the steps of etching the OBARC and trimming the photoresist material at the same time in an etching environment using a substantially isotropic etching operation. The etching environment includes an etching chamber with a top electrode and a bottom electrode wherein a mixture of abrasive gases can flow therethrough. Using an endpoint detection test, it is determined when an exposed portion of OBARC has been removed. The exposed portion of OBARC is an area of OBARC without photoresist protection and exposed to the etching environment. An overetch step is applied to trim the photoresist to a desired dimension. The time of the overetch step is based on the percentage of an endpoint time and the process condition of the overetch step is same as that of the endpoint step. COPYRIGHT: (C)2003,JPO