发明名称 GAS SHOWER HEAD, FILM DEPOSITION APPARATUS, AND FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To prevent different kinds of film deposition gases from entering through spaces generated between contact surfaces of metal members and from being mixed with each other in a shower head which is formed by stacking a plurality of metal members and can feed a plurality of kinds of film deposition gases to a substrate. SOLUTION: The shower head is constituted by stacking nickel plates in three stages, temporarily assembled by bolts, and installed in a chamber. Then, the shower head is heated by heaters provided on a placement table in the chamber and an upper side of the shower head. Very small uneven parts of each contact surface of the metal plates are started to melt, and the contact surfaces are subjected to the metal diffusion and bonding from this melting part. By continuing the heating until the metal plates are not detached even when the bolts are removed, any spaces present in the contact surfaces are removed, and the entire contact surfaces are joined with each other in an airtight manner. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003247073(A) 申请公布日期 2003.09.05
申请号 JP20020043483 申请日期 2002.02.20
申请人 TOKYO ELECTRON LTD 发明人 MURAKAMI MASASHI;HANADA YOSHIYUKI
分类号 C23C16/44;C23C16/455;(IPC1-7):C23C16/455 主分类号 C23C16/44
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