| 摘要 |
A wavefront measuring system and method for detecting phase aberrations in wavefronts that are reflected, transmitted through internally reflected within objects sought to be measured which includes placing a reticle (20) in the path of a return beam from the object (12), and placing a detector (22) at a diffraction pattern self-imaging plane relative to the reticle (20). A set of known polynomials is fitted to the wavefront phase gradient to obtain polynomial coefficients that describe aberrations in the object. |
