PHOTORESIST REMOVING APPARATUS AND METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY USING THE SAME

摘要

PURPOSE: A photoresist removing apparatus and a method for fabricating a liquid crystal display using the apparatus are provided to prevent a patterned photoresist thin film from being contaminated while remaining photoresist is removed. CONSTITUTION: A photoresist removing apparatus(100) includes a reaction chamber(110), an ozone provider(120), a DI water provider(130), and a substrate transfer device. The ozone provider has an ozone generator for generating ozone, and an ozone supply for supplying the ozone generated by the ozone generator to the reaction chamber. The DI water provider includes a DI water supply tank for storing DI water, and a DI water supply for spraying the DI water from the DI water supply tank into the reaction chamber. The substrate transfer device transfers a substrate on which a photoresist thin film to be removed into the reaction chamber.