发明名称 |
FILAMENT ISOLATING APPARATUS OF SEMICONDUCTOR IMPLANTER EQUIPMENT |
摘要 |
PURPOSE: A filament isolating apparatus of a semiconductor implanter equipment is provided to be capable of restraining the reaction between a filament installed at an arc chamber and impurity source gas. CONSTITUTION: A semiconductor implanter equipment comprises an arc chamber for ionizing supplied gas molecules, an electrode line connected to the arc chamber for supplying ionization energy, and an ion generation apparatus having a filament(40) connected to the electrode line. The semiconductor implanter equipment further includes a filament isolating part(50) for separating the filament from the arc chamber. The filament isolating part includes an inner hole(51) formed for connecting the filament and the filament isolating part and a protruding part(55) formed and protruded to the inner portion of the hole for supporting the filament.
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申请公布号 |
KR20030070992(A) |
申请公布日期 |
2003.09.03 |
申请号 |
KR20020010479 |
申请日期 |
2002.02.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, IM RAK;SHIN, SEUNG HUN |
分类号 |
H01J37/30;(IPC1-7):H01J37/30 |
主分类号 |
H01J37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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