| 发明名称 |
Method for forming high quality oxide layers of different thickness in one processing step |
| 摘要 |
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| 申请公布号 |
AU2003201110(A1) |
申请公布日期 |
2003.09.02 |
| 申请号 |
AU20030201110 |
申请日期 |
2003.01.20 |
| 申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
YOURI PONOMAREV;ROBERTUS T. F. SCHAIJK;JOSINE J. G. P. LOO |
| 分类号 |
H01L21/316;H01L21/28;H01L21/336;H01L21/8234;H01L21/8238;H01L21/8247;H01L27/102;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/316;H01L21/824;H01L21/823 |
主分类号 |
H01L21/316 |
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