| 摘要 |
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W>=2xTx(rhosub.Csub.lambdsub/T)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1x10-4 Pa to reduce a resistivity of the polymer film to 0.1 OMEGA.cm, Csub is a specific heat J/kg.K of the substrate, rhosub is a specific gravity kg/m3 of the substrate, lambdsub is a heat conductivity W/m.K of the substrate, and T is an irradiation time in the range of 10-9 sec to 10 sec.
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